Development of Proximity Effect Correction Method for E-Beam Lithography
碩士 === 國立臺灣大學 === 生醫電子與資訊學研究所 === 106 === Lithography is the key technology in integrated circuits manufacturing process, and the improvement of it is the main reason that Moore''s law can keep going. The rapid development of semiconductor industry and chips can become smaller and...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/khrsbt |