The Study of Shock Sensitivity of Hydrolyzed Deposits from Hexachlorodisilane

• Main Authors: LIU, CHIEN-HO, 劉建和
• Other Authors: CHEN, JENQ-RENN
• Format: Others
• Language: zh-TW
• Published: 2018
• Online Access: http://ndltd.ncl.edu.tw/handle/qf88dr

碩士 === 國立高雄第一科技大學 === 環境與安全衛生工程系碩士班 === 106 === Hexachlorodisilane (HCDS) is the most important raw materials for Atomic Layer Deposition (ALD) in modern semiconductor manufacturing process. It is a stable and low volatile liquid, but it also easily reacts with moisture. The hydrolyzed deposits are known to be shock sensitive. If the residual vapor of Hexachlorodisilane at the end of the process reacts with moisture in the air and form hydrolyzed deposits with shock sensitivity, it may cause serious fire and explosion if handled without care. In this work, a precise humidity control system is used to control the moisture content of the gas stream passing through the reaction zone to control the hydrolysis conditions of HCDS. The weight change with time, the formation of deposits during the hydrolysis process, the functional group analysis, and shock sensitivity tests were measured and analyzed to find the relationship between shock sensitivity and hydrolyzed deposits of HCDS at different hydrolysis conditions. The results show that the all hydrolyzed deposits from Hexachlorodisilane in different hydrolysis conditions are shock sensitive. The limiting impact ignition energy is however determined by the amount of moisture during hydrolysis. In the functional group analysis, three characteristic peaks of shock sensitivity are found from hydrolyzed deposits of Hexachlorodisilane. The relationship between the ratio of the absorbance of two characteristic peaks and the limiting impact ignition energy may be used to determine the shock sensitivity of hydrolyzed deposits from Hexachlorodisilane.