The Study of Shock Sensitivity of Hydrolyzed Deposits from Hexachlorodisilane
碩士 === 國立高雄第一科技大學 === 環境與安全衛生工程系碩士班 === 106 === Hexachlorodisilane (HCDS) is the most important raw materials for Atomic Layer Deposition (ALD) in modern semiconductor manufacturing process. It is a stable and low volatile liquid, but it also easily reacts with moisture. The hydrolyzed deposits are...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/qf88dr |