Optimization of Deposition of Amorphous Carbon Core Film to Alleviate Pattern Wiggling in the Self-aligned Double Patterning Process

碩士 === 國立交通大學 === 工學院半導體材料與製程設備學程 === 106 === Double patterning technology (DPT) is en extended optical photolithography technology for half pitch patterns of sub-30 nm nodes. DPT can be regarded as a bridging technology between Immersion and EUV lithographies. Integrated with self-alignement proces...

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Bibliographic Details
Main Authors: Lin, You-Yu, 林佑諭
Other Authors: Pan, Fu-Ming
Format: Others
Language:zh-TW
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/962yz4

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