Optimization of Deposition of Amorphous Carbon Core Film to Alleviate Pattern Wiggling in the Self-aligned Double Patterning Process
碩士 === 國立交通大學 === 工學院半導體材料與製程設備學程 === 106 === Double patterning technology (DPT) is en extended optical photolithography technology for half pitch patterns of sub-30 nm nodes. DPT can be regarded as a bridging technology between Immersion and EUV lithographies. Integrated with self-alignement proces...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/962yz4 |