Study on the S/D Activation and Phosphorus Diffusion Condition for the N-Channel Polycrystalline-Germanium Thin-Film Transistors via Continuous Wave Laser Crystallization

碩士 === 國立交通大學 === 電子研究所 === 106

Bibliographic Details
Main Authors: Liang, Hao-Hsiang, 梁皓翔
Other Authors: Cheng, Huang-Chung
Format: Others
Language:en_US
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/6nuzt2