Research on Electrical Improvement of Driver IC by Metal Dry Etching Process
碩士 === 國立交通大學 === 工學院精密與自動化工程學程 === 106 === ABSTRACT This purpose for the semiconductor foundry in the metal dry etching, prone to wafer defects (metal bridge defects), resulting in electrical abnormalities and low yield, we will address this part to improve. In this paper, the Taguchi method is us...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/qjkn2y |