Development of Mechanical Polishing and Chemical Mechanical Polishing for Single Crystal Silicon Carbide (SiC)
碩士 === 國立勤益科技大學 === 機械工程系 === 106 === In the modern semiconductor manufacturing processes, mechanical polishing (Lapping) and chemical mechanical polishing (CMP) has attained important processing step because of its ability to provide global planarization. The process of lapping has been long consid...
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| Format: | Others |
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2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/a8nd9x |