Fabrication of Zinc Oxide superlattice structures by atomic layer deposition
碩士 === 國立中興大學 === 光電工程研究所 === 106 === In this experiment, Atomic Layer Deposition (ALD) is used to form a superlattice structure on the SiO2/Si substrate by forming an ZnO doped Al2O3(AZO) structure with zinc oxide stacked alumina and forming a ZnO doped HfO2 (HZO) film with zinc oxide stacked yttri...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/537w9q |