Optical and Electrical Properties of Nanocrystalline Si:H Films Made by Inductively Coupled Plasma with Low-Inductance Antenna
碩士 === 明志科技大學 === 材料工程系碩士班 === 106 === n-type and p-type hydrogenated nanocrystalline silicon (nc-Si: H) thin films were deposited by the LIA-ICP-CVD (inductively coupled plasma CVD) system. Using Langmuir Probe discussed plasma conditions effect on the thin films deposition. The films properties Si...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/s94yr8 |