Nanomechanical properties and deformation behavior of Ⅲ-Nitride compound semiconductor thin films gown by metal- organic chemical vapor deposition
博士 === 義守大學 === 材料科學與工程學系 === 106 === In the present study, Mainly on the analysis of the nanamechanical properties of Mg-doped AlGaN and InN of the Group III nitride. The test piece was prepared on a sapphire substrate using Metal Organic Chemical Vapor Deposition(MOCVD). Applied X-ray Diffraction(...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/dhergy |