Optimization of indium tin oxide thin filmsdeposited by ion beam sputter deposition
碩士 === 國立臺灣科技大學 === 電子工程系 === 105 === Abstract ITO thin films have been successfully deposited at room temperature by ion beam sputter deposition. Effect of oxygen partial flow rates, ion beam energy and substrate to target distance are characterized. Experiment results reveal that as oxygen flow...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/hz4ra8 |