Study of Indirect Capacitively Coupled Hydrogen/Argon Plasma Discharge -Experimental Study and Simulation Analysis
碩士 === 國立清華大學 === 工程與系統科學系 === 105 === Plasma whichs adding additional energy on gas decomposes gas molecules being ionized. Ions are accelerated and produce ion bombardment by adding an applied electric field. Ion bombardment have an important influence in the semiconductor manufacturing process. O...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/nyyp6v |