Study of Shallow Junction Crystalline Silicon Solar Cells Fabricated by Low-Energy Ion Implantation
博士 === 國立清華大學 === 光電工程研究所 === 105 === Ion implantation is an advanced technology developed to inject dopants for shallow junction formation. Due to the ion-induced sputtering effect at low implant energies where dopants tend to accumulate at the silicon surface, the excess ion doses can be easily re...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/zw9ny6 |