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碩士 === 國立中央大學 === 機械工程學系 === 105 === In this study, ultra-thin hydrogenated amorphous silicon passivation layer (< 10 nm)was prepared on silicon substrate by using silane (SiH4), hydrogen (H2) and argon (Ar) to apply silicon heterojunction (SHJ) solar cells. The chamber of PECVD processing enviro...

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Bibliographic Details
Main Authors: Ching-Lin Tseng, 曾靜琳
Other Authors: 利定東
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/2xt46m