Long-Range Coulomb Interaction, Neutral Defect Scattering, and Remote Dipole Scattering in HKMG Ultra-Short Channel FETs

博士 === 國立交通大學 === 電子研究所 === 105 === The continued scaling of electronic devices encounters the significant performance degradations, which have so far been observed and attributed to the source/drain plasmons, neutral defects and remote dipoles. Both neutral defect and remote dipoles are caused by s...

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Bibliographic Details
Main Authors: Hsieh, Shang-Hsun, 謝尚勳
Other Authors: Chen, Ming-Jer
Format: Others
Language:en_US
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/36912155069672831867