Fabrication of Indium Gallium Zinc Oxide Sputtering Target and Its Applications to Thin-film Transistors and Transparent Resistive Random Access Memory Devices
博士 === 國立交通大學 === 材料科學與工程學系所 === 105 === A hybrid process of mechanical grinding and chemical dispersion was adopted to fabricate the nano-scale In2O3, Ga2O3, and ZnO powders for the preparation of 2-inch, single-phase InGaZnO4 (IGZO) sputtering target. The amorphous IGZO (a-IGZO) layers were then d...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/bjxkyv |