45nm High-k / Metal Gate process pilot-run procedure improvement

45nm High-k / Metal Gate process pilot-run procedure improvement

碩士 === 國立成功大學 === 電機工程學系碩士在職專班 === 105

Bibliographic Details
Main Authors: Chou-ChiehChen, 陳周傑
Other Authors: Hong-Tzer Yang
Format: Others
Language:zh-TW
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/6q57x5
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spelling ndltd-TW-105NCKU54421192019-05-15T23:47:01Z http://ndltd.ncl.edu.tw/handle/6q57x5 45nm High-k / Metal Gate process pilot-run procedure improvement 45奈米 高介電材料/金屬閘極製程之新產品試生產流程改善 Chou-ChiehChen 陳周傑 碩士 國立成功大學 電機工程學系碩士在職專班 105 Hong-Tzer Yang Shoou-Jinn Chang 楊宏澤 張守進 2017 學位論文 ; thesis 34 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立成功大學 === 電機工程學系碩士在職專班 === 105
author2 Hong-Tzer Yang
author_facet Hong-Tzer Yang
Chou-ChiehChen
陳周傑
author Chou-ChiehChen
陳周傑
spellingShingle Chou-ChiehChen
陳周傑
45nm High-k / Metal Gate process pilot-run procedure improvement
author_sort Chou-ChiehChen
title 45nm High-k / Metal Gate process pilot-run procedure improvement
title_short 45nm High-k / Metal Gate process pilot-run procedure improvement
title_full 45nm High-k / Metal Gate process pilot-run procedure improvement
title_fullStr 45nm High-k / Metal Gate process pilot-run procedure improvement
title_full_unstemmed 45nm High-k / Metal Gate process pilot-run procedure improvement
title_sort 45nm high-k / metal gate process pilot-run procedure improvement
publishDate 2017
url http://ndltd.ncl.edu.tw/handle/6q57x5
work_keys_str_mv AT chouchiehchen 45nmhighkmetalgateprocesspilotrunprocedureimprovement
AT chénzhōujié 45nmhighkmetalgateprocesspilotrunprocedureimprovement
AT chouchiehchen 45nàimǐgāojièdiàncáiliàojīnshǔzhájízhìchéngzhīxīnchǎnpǐnshìshēngchǎnliúchénggǎishàn
AT chénzhōujié 45nàimǐgāojièdiàncáiliàojīnshǔzhájízhìchéngzhīxīnchǎnpǐnshìshēngchǎnliúchénggǎishàn
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