Effects of Processing Condition and Al2O3 Substrate Pretreatment on the Electrical Properties of Ni-Cr-Si Based Thin Film Resistor

博士 === 國立成功大學 === 電機工程學系 === 105

Bibliographic Details
Main Authors:	Chen-SuChiang, 江承書
Other Authors:	Wen-Hsi Lee
Format:	Others
Language:	en_US
Published:	2017
Online Access:	http://ndltd.ncl.edu.tw/handle/sk599a

id	ndltd-TW-105NCKU5442037
record_format	oai_dc
spelling	ndltd-TW-105NCKU54420372019-05-15T23:47:00Z http://ndltd.ncl.edu.tw/handle/sk599a Effects of Processing Condition and Al2O3 Substrate Pretreatment on the Electrical Properties of Ni-Cr-Si Based Thin Film Resistor 製程條件與氧化鋁基板之前處理對鎳鉻矽薄膜電阻電性之影響 Chen-SuChiang 江承書博士國立成功大學電機工程學系 105 Wen-Hsi Lee 李文熙 2017 學位論文 ; thesis 99 en_US
collection	NDLTD
language	en_US
format	Others
sources	NDLTD
description	博士 === 國立成功大學 === 電機工程學系 === 105
author2	Wen-Hsi Lee
author_facet	Wen-Hsi Lee Chen-SuChiang 江承書
author	Chen-SuChiang 江承書
spellingShingle	Chen-SuChiang 江承書 Effects of Processing Condition and Al2O3 Substrate Pretreatment on the Electrical Properties of Ni-Cr-Si Based Thin Film Resistor
author_sort	Chen-SuChiang
title	Effects of Processing Condition and Al2O3 Substrate Pretreatment on the Electrical Properties of Ni-Cr-Si Based Thin Film Resistor
title_short	Effects of Processing Condition and Al2O3 Substrate Pretreatment on the Electrical Properties of Ni-Cr-Si Based Thin Film Resistor
title_full	Effects of Processing Condition and Al2O3 Substrate Pretreatment on the Electrical Properties of Ni-Cr-Si Based Thin Film Resistor
title_fullStr	Effects of Processing Condition and Al2O3 Substrate Pretreatment on the Electrical Properties of Ni-Cr-Si Based Thin Film Resistor
title_full_unstemmed	Effects of Processing Condition and Al2O3 Substrate Pretreatment on the Electrical Properties of Ni-Cr-Si Based Thin Film Resistor
title_sort	effects of processing condition and al2o3 substrate pretreatment on the electrical properties of ni-cr-si based thin film resistor
publishDate	2017
url	http://ndltd.ncl.edu.tw/handle/sk599a
work_keys_str_mv	AT chensuchiang effectsofprocessingconditionandal2o3substratepretreatmentontheelectricalpropertiesofnicrsibasedthinfilmresistor AT jiāngchéngshū effectsofprocessingconditionandal2o3substratepretreatmentontheelectricalpropertiesofnicrsibasedthinfilmresistor AT chensuchiang zhìchéngtiáojiànyǔyǎnghuàlǚjībǎnzhīqiánchùlǐduìnièluòxìbáomódiànzǔdiànxìngzhīyǐngxiǎng AT jiāngchéngshū zhìchéngtiáojiànyǔyǎnghuàlǚjībǎnzhīqiánchùlǐduìnièluòxìbáomódiànzǔdiànxìngzhīyǐngxiǎng
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Effects of Processing Condition and Al2O3 Substrate Pretreatment on the Electrical Properties of Ni-Cr-Si Based Thin Film Resistor

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