Effects of Processing Condition and Al2O3 Substrate Pretreatment on the Electrical Properties of Ni-Cr-Si Based Thin Film Resistor

博士 === 國立成功大學 === 電機工程學系 === 105

Bibliographic Details
Main Authors: Chen-SuChiang, 江承書
Other Authors: Wen-Hsi Lee
Format: Others
Language:en_US
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/sk599a