The tungsten trioxide thin film properties research of oxygen flow and process pressure by RF sputtering in the room temperature
碩士 === 國立中興大學 === 光電工程研究所 === 105 === This experiment is using RF magnetron sputtering method (RF magnetron sputter) to make WO3 (Tungsten Trioxide) films on a Corning glass substrate, with Ar, and O2 in different ratios (1:1, 1:3, 3:1) and various working pressure (2mtorr, 10mtorr, 50mtorr), to inv...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/43816411341986454875 |