Effects of Surface Morphology and Molecular Structure on the Wettability of Photosensitive Acrylic Film
碩士 === 國立中興大學 === 化學工程學系所 === 105 === The rapid development of opto-electrical industry promotes the photosensitive polymer films becoming the most common application of photoresist to be used for printed circuit board, semiconductor device and micro-electrical mechanics. However, the wettability be...
Main Authors: | Yen-Rung Jhu, 朱彥蓉 |
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Other Authors: | Wen-Tung Cheng |
Format: | Others |
Language: | zh-TW |
Published: |
2017
|
Online Access: | http://ndltd.ncl.edu.tw/handle/49855257410404265637 |
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