Effects of Surface Morphology and Molecular Structure on the Wettability of Photosensitive Acrylic Film

碩士 === 國立中興大學 === 化學工程學系所 === 105 === The rapid development of opto-electrical industry promotes the photosensitive polymer films becoming the most common application of photoresist to be used for printed circuit board, semiconductor device and micro-electrical mechanics. However, the wettability be...

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Bibliographic Details
Main Authors: Yen-Rung Jhu, 朱彥蓉
Other Authors: Wen-Tung Cheng
Format: Others
Language:zh-TW
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/49855257410404265637

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