Effects of Surface Morphology and Molecular Structure on the Wettability of Photosensitive Acrylic Film
碩士 === 國立中興大學 === 化學工程學系所 === 105 === The rapid development of opto-electrical industry promotes the photosensitive polymer films becoming the most common application of photoresist to be used for printed circuit board, semiconductor device and micro-electrical mechanics. However, the wettability be...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/49855257410404265637 |