Structure and Properties of the CrAlSiN Hard Films by Physical Vapor Deposition

• Main Authors: Wang,Chun-Sian, 王純顯
• Other Authors: Hsu,Chun-Yao
• Format: Others
• Language: zh-TW
• Published: 2017
• Online Access: http://ndltd.ncl.edu.tw/handle/qwx8s7

碩士 === 龍華科技大學 === 機械工程系碩士班 === 105 === Solid ceramic thin films that are made of transition metal nitrides, such as ZrWN, CrWN, TiAlN and TiN, are used on cutting and forming tools, in various industrial applications where there is an abrasive wear environment, and as a diffusion barrier and protective layer. The aim of this paper was to evaluate CrAlSiN hard films fabricated using reactive magnetron co-sputter with adjusted deposition parameters. An orthogonal array, the signal-to-noise ratio and analysis of variance are used to analyze the effect of the deposition parameters. The Taguchi method for design of a robust experiment, the interactions between factors was also investigated. The main deposition parameters, such as Cr direct current (dc) power, Al dc power, Si radio frequency (rf) power, and bias the substrates with rf power, were optimized. The results of this study show that the substrate bias has the most significant effect on hardness. The experimental results show that the Taguchi method allowed a suitable solution to the problem, with the minimum number of trials, compared to a full factorial design. With the optimized CrAlSiN hard films deposition conditions, the hardness, Young’s modulus and friction coefficient were 31.26 Gpa, 258.58 Gpa and 0.50, respectively. Furthermore, this study also investigates the properties of machining MAR-M247 nickel-based superalloy, at different coated tools were tested in dry conditions.