Effect of different processing on the optical and electrical properties of Al：FZO thin film
碩士 === 國立高雄應用科技大學 === 機械工程系 === 105 === In this thesis,the optical and electrical properties of Al-doped ZnO thin film are investigated by different annealing temperature of 200oC,300oC ,400oC and 500oC,respectively.The X-ray diffraction(XRD) analysis results show that all of the films have a strong...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/7v735r |