Effects of annealing temperatures on microstructural and nanomechanical properties of Cu-doped In2O3 thin films

碩士 === 義守大學 === 材料科學與工程學系 === 105 === In this study, the microstructural and nanomechanical properties of Cu-doped In2O3 thin films with various annealing temperatures of 700-900 ° C are investigated by using XRD, SEM and nanoindentation techniques. The Cu-doped In2O3 thin films are deposited on Co...

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Bibliographic Details
Main Authors: Huan-Chang Wang, 王煥昌
Other Authors: Sheng-Rui Jian
Format: Others
Language:zh-TW
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/43ky48