The Study of Influence of extreme ultraviolet (EUV) on Lithography

碩士 === 中華大學 === 機械工程學系 === 106 === The thesis was to discuss the possible influence of EUV (Extreme Ultraviolet) and LIL (Liquid immersion lithography) lithography in semiconductor process. This including the EUV progress, and how it works with variable process parameters. The related applications...

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Bibliographic Details
Main Authors: LI,LIN-CHIH, 李凜志
Other Authors: LIN,JIUM-MING
Format: Others
Language:zh-TW
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/zehu3u