Substrate Current Characteristics for 28 nm HK/MG NMOSFETs under Hot Carrier Stress

碩士 === 國立臺北科技大學 === 機電整合研究所 === 104 === The hot carrier effect is usually monitored by the substrate current in submicrometer process. The substrate current is an important issue. Due to only a few recent researchers in-vestigating the substrate current of nano-node nMOSFETs under the hot carrier st...

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Bibliographic Details
Main Authors: Cheng-Wei Bai, 白承偉
Other Authors: Heng-Sheng Huang;Mu-Chung Wang
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/4au4c8