Diffraction Based Overlay Target Design for On-Product Overlay Measurement
碩士 === 國立臺灣科技大學 === 自動化及控制研究所 === 104 === To acquire the advanced-node technology, overlay becomes the key challenges for the nano-lithography in the semiconductor manufacturing. Overlay needs to evolve to accurately represent product device patterns for the control of overlay errors. The diffractio...
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| Format: | Others |
| Language: | en_US |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/t6ec6a |