Design of novel interference lithography systems

碩士 === 國立臺灣科技大學 === 光電工程研究所 === 104 === The periodic structure realized with conventional Lloyd’s Mirror interference lithography system has limitation on its period and exposure area due to the geometric structure. To overcome the problem, this thesis instigates the formation of long-period grating...

Full description

Bibliographic Details
Main Authors: Wei-Hung Wu, 吳偉泓
Other Authors: San-Liang Lee 
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/t9h2y7