Atomic Layer Deposition of Nano-laminated Films for use as Flexible and Stretchable Gas Barrier, Dielectrics, and Conductors
博士 === 國立臺灣大學 === 材料科學與工程學研究所 === 104 === In this dissertation, we used atomic layer deposition (ALD) and molecular deposition technology (MLD) to fabricate flexible and stretchable gas barrier films, and the gas barrier performances were optimized by regulating surface morphology, changing oxidant...
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| Format: | Others |
| Language: | en_US |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/55318455247214987054 |