Study on the Characteristics of Thin-Film Transistor and Photodetector Based on Plasma-Modified Polycrystalline Tin-Oxide Channels

碩士 === 國立臺灣師範大學 === 機電工程學系 === 104 === In this work, the low-temperature plasma treatment was employed to modify the polarity of tin-oxide (SnO) semiconductor and investigated the potential applications of SnO thin-film transistors. The intrinsic p-type SnO TFT showed a low threshold voltage of -0.8...

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Bibliographic Details
Main Authors: Chen, Po-Wei, 陳柏維
Other Authors: Cheng, Chin-Pao
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/93002499316592366895