Probing Interfacial Strains in Si/Si0.8Ge0.2/Si Using Three-Beam Bragg-Surface Diffraction

碩士 === 國立清華大學 === 物理系 === 104 === The semiconductor devices are composed of thin-film systems, therefore, the strain is one of the important factors to the performance of the device. We probe interfacial strains in Si/Si0.8Ge0.2/Si using three-beam Bragg-surface diffraction. The experiment was perfo...

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Bibliographic Details
Main Authors: Yu, Lien Kuang, 于璉光
Other Authors: Chang,Shih Lin
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/67929895804984717607

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