Formation of nano silicon channel with thin silicon-rich silicon oxide
碩士 === 國立清華大學 === 材料科學工程學系 === 104 === PECVD is used to deposit silicon-rich silicon dioxide thin film. After annealing process, it turns out to be silicon dioxide thin film containing nano-silicon channel. The experiment shows that silicon content increases when silane ratio was raised during depos...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/02847038318764954812 |