A study on conduction current mechanism investigation and reliability improvement induced by supercritical fluid treatment in Hafnium oxide-based Resistive random-access memory
碩士 === 國立高雄師範大學 === 化學系 === 104 === In order to understand the unstable configuration that occurs when measuring Pt / HfO2 / TiN device, in this experiment use the water-gas treatment on Pt / HfO2 / TiN device, and with conduction mechanisms and materials analysis, plus the member has bipolar operat...
Main Authors: | Yi-Chung Huang, 黃一中 |
---|---|
Other Authors: | Jung-Hui Chen |
Format: | Others |
Language: | zh-TW |
Published: |
2016
|
Online Access: | http://ndltd.ncl.edu.tw/handle/17542388235874369352 |
Similar Items
-
Study on The Resistive Switching Properties and Reliability of Hafnium Oxide Film Resistance Random Access Memory
by: Kai-Lin Huang, et al.
Published: (2019) -
Hafnium Oxide Devices for Resistance Random Access Memory Application
by: Liu Chun Wei, et al.
Published: (2009) -
Study on Supercritical Fluids and Resistance Random Access Memory
by: Kuan-Chang Chang, et al.
Published: (2014) -
Study on Indium Electrode Effect of Hafnium oxide-based Resistance Random Access Memory(RRAM)
by: Lin-Yi Shih, et al.
Published: (2017) -
Study on the Resistive Switching Characteristics of the Hafnium Oxide-Based Resistive Random Access Memory (RRAM) Devices
by: Lin, Kuan-Yu, et al.
Published: (2016)