Bipolar resistive switching of NiO/HfO double-layer thin films
碩士 === 國立東華大學 === 物理學系 === 104 === Double-layers of nickel oxide/hafnium dioxides (NiO/HfO2) are synthesized on p-Si wafers using hot-filament metal oxide deposition technique. The thickness of the HfO2 thin films is controlled using the deposition time while the synthesis of NiO are kept same. The...
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| Format: | Others |
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2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/30159625652929499839 |