Development of In-situ Monitoring System for Metal Organic Chemical Vapor Deposition
碩士 === 國立中央大學 === 光機電工程研究所 === 104 === An in-situ monitoring system for Metal Organic Chemical Vapor Deposition (MOCVD) process is presented. The proposed monitoring system consisted of the modules of growth-rate and temperature, which is able to precisely measure the growth rate of thin film and...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/03440149853582012539 |