Investigation of flow patterns with high temperature substrate in a chemical vapor deposition reactor
碩士 === 國立交通大學 === 機械工程系所 === 104 === Chemical vapor deposition (CVD) is widely used for manufacturing semiconductor materials and thin-films. The flow field influences the uniformity in the deposition process. The study build a test chamber for gas flow visualization experiments. The investigated pa...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/yz6j8y |