Study on Thermal-induced Delamination and Fracture of Through Silicon Via structures.

碩士 === 國立成功大學 === 機械工程學系 === 104 === Recently, through silicon via structure (TSV) technology has become important in three-dimension technology, because it provides the short distance connection can also be internal electrical conduction and thermal conduction. TSV structure of process technology d...

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Bibliographic Details
Main Authors: Yi-ZheGuo, 郭亦哲
Other Authors: Jen-Fin Lin
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/64591368596657684807