Growth of Core-Shell n-type/p-type Gallium Nitride Nanorods by PECVD for Light-Emitting Diode Applications
碩士 === 國立成功大學 === 化學工程學系 === 104 === Owing to the significant optoelectronic property, GaN is used for light emitting diodes, laser diodes, sensors and high mobility transistor. Since 1-D nano-structure has the advantage of high aspect ratio and high specific surface area which help releases the...
Main Authors: | Shiang-ChiChang, 張香棨 |
---|---|
Other Authors: | Franklin Chau-Nan Hong |
Format: | Others |
Language: | zh-TW |
Published: |
2016
|
Online Access: | http://ndltd.ncl.edu.tw/handle/39487649448409518302 |
Similar Items
-
Growth of Core-Shell Gallium Nitride/ Indium Gallium Nitride Nanorods for Light-Emitting Diode Applications
by: Shu-HanYang, et al.
Published: (2017) -
Fabrication of p-type/n-type Gallium Nitride Nanorods Light-Emitting Diode Devices
by: Yu-ChiHuang, et al.
Published: (2018) -
The study of N-type Zinc Oxide Nanorods on Gallium Nitride Light Emitting Diode by Low Temperature
by: 劉柏均
Published: (2016) -
Growth of Gallium Nitride, Indium Gallium Nitride and Aluminum Gallium Nitride Nanocrystals for Light-emitting Diode Applications
by: Chung-WeiChuang, et al.
Published: (2016) -
Surface Architectures on Gallium Nitride Light Emitting Diodes for Light Extraction Improvement
by: Jia-chi Lin, et al.
Published: (2010)