The characteristics of p-type amorphous carbon thin films prepared by radio-frequency plasma enhanced chemical vapor deposition using different ammonia/ethane ratios
碩士 === 國立中興大學 === 材料科學與工程學系所 === 104 === This study investigates the effects of different ammonia/ethane (NH3/C2H6) ratios on the properties of p-type amorphous carbon thin films (a-C:H(N)) deposited on n-type silicon (n-Si) substrate prepared by plasma enhanced chemical vapor deposition. The radio-...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/63012624394169478399 |