Preparation of Cu3N thin films by sputter using air as a reactive gas and application evaluation
碩士 === 國立中興大學 === 材料科學與工程學系所 === 104 === In the literature, preparation of Cu3N thin films were prepared by sputtering at high vacuum, which requires to avoid the influence of residual air in the chamber. The high vacuum need more pumping time and more pump, it will make cost up. The objective of th...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/43045982424611400766 |