Effect of an OES feedback control on the properties of nc-TiC/a-C:H coated by high power impulse magnetron sputtering

• Main Authors: YANG, FU-CHI, 楊復期
• Other Authors: CHANG, CHI-LUNG
• Format: Others
• Language: zh-TW
• Published: 2016
• Online Access: http://ndltd.ncl.edu.tw/handle/73575470850286561707

碩士 === 明道大學 === 材料與能源工程學系碩士班 === 104 === An optical emission spectrometer (OES) feedback-controlled high power impulse magnetron sputter deposition system was used to deposit nc-TiC/a-C:H thin films in a reactive mode. The plasma emission intensity of Ti2+ ions at the emission wavelength of 365 nm was monitored and the amount of reactive C2H2 gas was precisely controlled to maintain stable emission intensity during the deposition process. By controlling the C2H2 input and using different Ti2+ ion emission intensities, various nc-TiC/a-C:H thin films were obtained at a fixed duty cycle of 2% at 75°C, using a determined pulse frequency of 500 Hz for a more stable reactive mode. The characteristics and mechanical properties of the obtained films were also investigated. For the HiPIMS process, a higher pulse frequency can inhibit the phenomenon of target poison. A key point, the properties and phase transformation from TiC to nc-TiC/a-C:H films, was clearly discriminated at the OES intensity of 40%. The highest hardness of 26 GPa was obtained at the OES intensity of 40%, where the film was composed of TiC. In addition, the lowest friction coefficient of 0.08 was obtained at the OES intensity of 7%, which represents the nanocomposite structure of nc-TiC/a-C:H films.