Design and Develop for the Quartz parts of the Polishing Technology
碩士 === 嶺東科技大學 === 創意產品設計系碩士班 === 104 === Abstract This study focused on the industry's chemical mechanical polishing (Chemical Mechanical Polishing, CMP) process used by the soft polishing pad, a hot melt adhesive material spraying equipment designed to replace the soft polishing pad, and with...
Main Authors: | Ta-Chun Li, 李大淳 |
---|---|
Other Authors: | TSAI,FENG-CHE |
Format: | Others |
Language: | zh-TW |
Published: |
2015
|
Online Access: | http://ndltd.ncl.edu.tw/handle/46200236503099627886 |
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