Iron Oxide Thin Films Prepared Using a Novel Annealing Processing

碩士 === 國立高雄應用科技大學 === 化學工程與材料工程系博碩士班 === 104 === In this study, iron oxide thin films were prepared by an atmospheric pressure plasma annealing. The first part, the thin films were coated on the glass substrate, and then specimens were dried at 1-5 days. After that, specimens were annealed using atm...

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Bibliographic Details
Main Authors: YANG,SHUN-HSIANG, 楊舜翔
Other Authors: CHEN,HONG-YING
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/85pz64