Plasma Annealed Ti/Al Films Applied inLow Emissivity Glass
碩士 === 崑山科技大學 === 電機工程研究所 === 105 === In this study, the low-emissivity glass of aluminum / titanium two-layer film was prepared by electroplating the substrate glass in the form of electron gun, and then placed in the vacuum chamber for plasma annealing. The change of the crystallization phenomenon...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/94152590570396591068 |