Direct Micro/Nanoimprint and Fidelity Analysis with Full Patterns Grating

碩士 === 國立中正大學 === 機械工程系研究所 === 104 === The goal of direct nanoimprint process is to fabricate bi-layered metallic wire-grid polarizers (WGP). The most critical process of this fabrication is how to transfer full and large nano-pattern from mold to imprinted material. If this process works, this tech...

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Bibliographic Details
Main Authors: KUO, CHIA-SHI, 郭家熹
Other Authors: AOH, JONG-NING
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/32117617615739678722