Performance study on dielectric SiNx taper Structure by using dryetching process
碩士 === 元智大學 === 光電工程學系 === 103 === In this study, we will research into the etching process of the SF6 plasma on SiNx, including how the changes in the plasma power and the SF6/ O2 flow ratio values,etching rate of the TFT components protective layer, SiNx.Improve on dielectric SiNx taper Structure...
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/52242324907421823934 |