Simulate of PECVD Chamber Clean Using Remote Plasma System
碩士 === 國立高雄大學 === 電機工程學系碩士班 === 103 === Thin film deposition is one of the most important processes in fabricating semiconductor devices. An automatic deposition system usually equiped with self-cleaning function; the system can clean a vacuum chamber after chemical reaction inside the chamber. Remo...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/79153624133876664394 |