Growth Characteristics of V-doped TiO2 Thin Films by Reactive Co-sputtering
碩士 === 國立臺南大學 === 材料科學系碩士班 === 103 === TiO2 thin films have the characteristics of good mechanical, chemical, and physical properties, which make them a popular material of intensive research. But it is limited by wide band gap and poor conductivity. They can be applied as low-resistance transparent...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/83ktfx |